ASSESSEMENT OF THE EFFECT OF TEMPERATURE ON DRIFT AND DIFFUSION CURRENT ON PN-JUNCTION SILICON DIODE UNDER FORWARD BIAS CONDITION

Authors

  • EMMANUEL IFEANYI UGWU Department of Physics, Nigerian Army University Biu, Nigeria. Author
  • MUJAHEED MUHAMMAD Department of Physics, Nigerian Army University Biu, Nigeria Author
  • MOHAMMAD JAAFAR Department of Physics, Nigerian Army University Biu, Nigeria Author
  • SUNDAY IKPUGHUL IYUA Department of Physics, Nigerian Army University Biu, Nigeria. Author

DOI:

https://doi.org/10.60787/jnamp.vol71no.613

Keywords:

Temperature, Diffusion, Einstein’s Relation, Drift Current, Forward bias, p-n Junction

Abstract

Assessment on how temperature effects diffusion and drift current of p-n junction under forward bias condition was carried out here using silicon diode as the base of study with consideration of the Einstein diffusion relation for both holes and electrons as the constituent of carriers in p-n junction. The temperature of the diode was set at various values starting with room temperature and ensuring that it is maintained during each set of experiment for every forward bias voltage when the drift current and diffusion current is being obtained. This was carried out for all the set temperature as set out in work and the trends were presented on tables and graphs as showcased here where it is seen that the drift and diffusion current for various temperatures behave uniquely in relation to given forward bias voltage and current.

 

         Views | Downloads: 0 / 0

Downloads

Download data is not yet available.

References

Ugwu, E.I (2019). “Comparative Study of the variation of the influence of temperature on Carrier concentration and electron drift on silicon and gallium arsenide”. Pacific Journal of Science and Technology. 20(2):50-62.

Donald and (2003) Semiconductor Physics and Devices: Basic Principles 3rd (Edn), McGraw-Hill Higher Education.

Arora, N. D., Hauser 1. R., and D. 1. Roulston, (1982) "Electron and Hole Mobilities in Silicon as A Function of Concentration and Temperature," IEEE Tran. On Electron Devices, Ed-29. 292

Vasudeva, A.S., (2010).Modern Engineering Physics. (5th revised ed., pp.284-305). New Delhi: S. Chand & companyLtd. ISBN: 81-219-1757-3.

Baclaran G. and P. Ostoja, "Electron Mobility Empirically Related to the Phosphorus Concentration in Silicon," Solid-State Electronics, 18,579 (1975).

Maziar.C. M. and M. S. Lundstrom, (1986)."Caughey-Thomas Parameters for Electron Mobility calculations In Gaas," Electronics Letters, 22, 565

Avadhanulu, M.N., Kshirsagar, P.G.,(2013). Text book of Engineering Physics. (Revised edition.chap.3). New Delhi: S. Chand Company ltd.lSBN:81-219-0817-5

Theraja, B.L. (2005). Basic electronics Solid state. (Multicoloured. pp. 153-176). New Delhi: S. Chand & Company ltd. ISBN: 80-219-2555-X.

Emmanuel Ifeanyi Ugwu, Ede Israel Chikwado and Kālu Onyekachi (is 2019) Theoretical Analysis of the effect of impurity on the Fermi level of Silicon and gallium Arsenide Semiconductor materials. JNAMP Vol. 50 pp.297-302

Neamen, D.A. (2003). Semiconductor Physics and Devices: Basic Principles (3rd Ed.). McGraw-Hill Higher Education: New York, NY. ISBN 0-07- 232107-5.

Ugwu, E .I, Nwokwo M.I.O., Bashiru I and Kalu O. (2019) Study of the effect of Temperature on the Electronic Conductivity of Silicon and gallium.JNAMP.Vol.52; pp. 239-246.

Theraja, B.L., (2012). Basic Electronics solid state (Multicolored). New Delhi: S.Chand & Company Ltd, pp.153-176.

Neamen, D.A. 2003. Semiconductor Physics and Devices: Basic Principles (3rd ed.). McGraw-Hill Higher Education: New York, NY. ISBN 0-07- 232107-5.

Emmanuel Ifeanyi Ugwu, Ede Israel Chikwado and Kālu Onyekachi (is 2019) Theoretical Analysis of the effect of impurity on the Fermi level of Silicon and gallium Arsenide Semiconductor materials. JNAMP Vol. 50 pp.297-302

Singhal, S., Saxena, A K, and S Dasgupta, 2007, Estimation of Various Scattering Parameters and 2 - DEG Mobility’s From Electron Mobility y Calculations in The Three Conduction Bands Г, L dan X of Gallium Arsenide, PRAMANA-Journal of Physics: Indian Academy of Sciences, Volume 69, page 687-692.

Varshni YP (1967) Temperature dependence of the energy gap in semiconductors. Physica 34:149–154.

Wagner J, del Alamo JA (1988) Band-gap narrowing in heavily doped silicon: A comparison of optical and electrical data. J Appl Phys 63(2): 425-429.

Downloads

Published

2026-01-07

Issue

Section

Articles

How to Cite

ASSESSEMENT OF THE EFFECT OF TEMPERATURE ON DRIFT AND DIFFUSION CURRENT ON PN-JUNCTION SILICON DIODE UNDER FORWARD BIAS CONDITION. (2026). The Journals of the Nigerian Association of Mathematical Physics, 71, 151-158. https://doi.org/10.60787/jnamp.vol71no.613

Share

Similar Articles

1-10 of 40

You may also start an advanced similarity search for this article.